Publications

This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.

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230 results for King-Ning Tu

Formation and Schottky behavior of manganese silicides on n-type silicon
- - M. Eizenberg
  - K.N. Tu
- 1982
- Journal of Applied Physics
Thermal stability and growth kinetics of Co₂Si and CoSi in thin-film reactions
- - K.N. Tu
  - G. Ottaviani
  - et al.
- 1982
- Journal of Applied Physics
Growth kinetics of planar binary diffusion couples: "Thin-film case" versus "bulk cases"
- - U. Gösele
  - K.N. Tu
- 1982
- Journal of Applied Physics
NiSi formation at the silicide/Si interface on the NiPt/Si system
- - G. Ottaviani
  - K.N. Tu
  - et al.
- 1982
- Journal of Applied Physics
Titanium-tungsten contacts to Si: The effects of alloying on Schottky contact and on silicide formation
- - S.E. Babcock
  - K.N. Tu
- 1982
- Journal of Applied Physics
Laser writing on silicon-metal bilayers for optical storage. II. Microscopic study
- - S.R. Herd
  - K.N. Tu
  - et al.
- 1982
- Journal of Applied Physics
Ion-beam-induced metastable Pt₂Si₃ phase. III. Structure and diffusion in amorphous Pt₂Si₃
- - J.F. Graczyk
  - K.N. Tu
  - et al.
- 1982
- Journal of Applied Physics
A simple analysis of inert marker motion in a single compound layer for solid-phase epitaxy and for binary diffusion couples
- - U. Gösele
  - K.N. Tu
  - et al.
- 1982
- Journal of Applied Physics
A study of vanadium as diffusion barrier between aluminum and gadolinium silicide contacts
- - M. Eizenberg
  - R.D. Thompson
  - et al.
- 1982
- Journal of Applied Physics
Formation of shallow silicide contacts of high Schottky barrier on Si: Alloying Pd and Pt with W versus alloying Pd and Pt with Si
- - M. Eizenberg
  - K.N. Tu
- 1982
- Journal of Applied Physics