Publications

This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.

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41 results for Gregory Breyta

Novel fluoropolymers for use in 157 nm lithography
- - Hiroshi Ito
  - G.M. Wallraff
  - et al.
- 2001
- J. Photopolym. Sci. Tech.
Factors controlling pattern formation in chemically amplified resists at sub-100 nm dimensions
- - W.D. Hinsberg
  - F.A. Houle
  - et al.
- 1999
- J. Photopolym. Sci. Tech.
Platform-dependent properties of 193nm single layer resists
- - Robert D. Allen
  - Thomas I. Wallow
  - et al.
- 1998
- J. Photopolym. Sci. Tech.
Etch selectivity of 4SiMA: Hydroxystyrene based copolymers. silicon chemistry for bilayer resist systems
- - G.M. Wallraff
  - Carl E. Larson
  - et al.
- 1998
- J. Photopolym. Sci. Tech.
The influence of photoacid structure on the design and performance of 193-nm resists
- - Robert D. Allen
  - Juliann Opitz
  - et al.
- 1997
- J. Photopolym. Sci. Tech.
Dissolution kinetics and PAG interaction of phenolic resins in chemically amplified resists
- - Hiroshi Ito
  - Debra-Fenzel Alexander
  - et al.
- 1997
- J. Photopolym. Sci. Tech.
Progress in 193 nm positive resists
- - R.D. Allen
  - R. Soortyakumaran
  - et al.
- 1996
- J. Photopolym. Sci. Tech.
193 nm photoresist r&d: the risk & challenge
- - Donald C. Hofer
  - Robert Allen
  - et al.
- 1996
- J. Photopolym. Sci. Tech.
Lithographic feasibility of escap beyond quarter micron
- - Hiroshi Ito
  - Greg Breyta
  - et al.
- 1996
- J. Photopolym. Sci. Tech.
Approach toward environmental stabilization of chemical amplification resists
- - Hiroshi Ito
  - William P. England
  - et al.
- 1993
- J. Photopolym. Sci. Tech.