Experimental realization of an order-finding algorithm with an NMR quantum computer
- Lieven M. K. Vandersypen
- Matthias Steffen
- et al.
- 2000
- Physical Review Letters
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41 results for Gregory Breyta
Monomer reactivities and kinetics in radical copolymerization of hydroxystyrene derivatives and tert-butyl (meth)acrylate
- Hiroshi Ito
- Charlie Dalby
- et al.
- 2000
- Macromolecules
Effect of resist components on image spreading during postexposure bake of chemically amplified resists
- W.D. Hinsberg
- F.A. Houle
- et al.
- 2000
- Microlithography 2000
Implementation of a three-quantum-bit search algorithm
- Lieven M. K. Vandersypen
- Matthias Steffen
- et al.
- 2000
- Applied Physics Letters
Approaches to etch resistant 193-nm photoresists: Performance and prospects
- R.D. Allen
- Juliann Opitz
- et al.
- 1999
- SPIE Advances in Resist Technology and Processing 1999
Experimental method for quantifying acid diffusion in chemically amplified resists
- G.M. Wallraff
- W.D. Hinsberg
- et al.
- 1999
- SPIE Advances in Resist Technology and Processing 1999
High resolution 248 nm bilayer resist
- Q. Lin
- K.E. Petrillo
- et al.
- 1999
- SPIE Advances in Resist Technology and Processing 1999
Polymer platform dependent characteristics of 193 nm photoresists
- Juliann Opitz
- R.D. Allen
- et al.
- 1999
- SPIE Advances in Resist Technology and Processing 1999
Factors controlling pattern formation in chemically amplified resists at sub-100 nm dimensions
- W.D. Hinsberg
- F.A. Houle
- et al.
- 1999
- J. Photopolym. Sci. Tech.
Etch selectivity of 4SiMA: Hydroxystyrene based copolymers. silicon chemistry for bilayer resist systems
- G.M. Wallraff
- Carl E. Larson
- et al.
- 1998
- J. Photopolym. Sci. Tech.