Publications

This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.

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49 results for Michael Liehr

Selectivity in copper chemical vapor deposition
- - Susan L. Cohen
  - Michael Liehr
  - et al.
- 1992
- Applied Physics Letters
Low pressure chemical vapor deposition of oxide from SiH₄/O ₂: Chemistry and effects on electrical properties
- - M. Liehr
  - S. Cohen
- 1992
- Applied Physics Letters
Mechanisms of copper chemical vapor deposition
- - Susan L. Cohen
  - Michael Liehr
  - et al.
- 1992
- Applied Physics Letters
Kinetics of nucleation and growth of Si on SiO₂ in very low pressure SiH₄ chemical vapor deposition
- - S.S. Dana
  - M. Liehr
  - et al.
- 1992
- Applied Physics Letters
Chemistry of fluorine in the oxidation of silicon
- - S.R. Kasi
  - M. Liehr
  - et al.
- 1991
- Applied Physics Letters
Hydrocarbon reaction with HF-cleaned Si(100) and effects on metal-oxide-semiconductor device quality
- - S.R. Kasi
  - M. Liehr
  - et al.
- 1991
- Applied Physics Letters
Surface etching and roughening in integrated processing of thermal oxides
- - M. Offenberg
  - M. liehr
  - et al.
- 1991
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Kinetics of silicon epitaxy using SiH₄ in a rapid thermal chemical vapor deposition reactor
- - M. Liehr
  - C.M. Greenlief
  - et al.
- 1990
- Applied Physics Letters
Ultraclean, integrated processing of thermal oxide structures
- - M. Offenberg
  - M. Liehr
  - et al.
- 1990
- Applied Physics Letters
Vapor phase hydrocarbon removal for Si processing
- - Srinandan R. Kasi
  - M. Liehr
- 1990
- Applied Physics Letters