Selectivity in copper chemical vapor deposition
- Susan L. Cohen
- Michael Liehr
- et al.
- 1992
- Applied Physics Letters
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49 results for Michael Liehr
Low pressure chemical vapor deposition of oxide from SiH4/O 2: Chemistry and effects on electrical properties
- M. Liehr
- S. Cohen
- 1992
- Applied Physics Letters
Mechanisms of copper chemical vapor deposition
- Susan L. Cohen
- Michael Liehr
- et al.
- 1992
- Applied Physics Letters
Kinetics of nucleation and growth of Si on SiO2 in very low pressure SiH4 chemical vapor deposition
- S.S. Dana
- M. Liehr
- et al.
- 1992
- Applied Physics Letters
Chemistry of fluorine in the oxidation of silicon
- S.R. Kasi
- M. Liehr
- et al.
- 1991
- Applied Physics Letters
Hydrocarbon reaction with HF-cleaned Si(100) and effects on metal-oxide-semiconductor device quality
- S.R. Kasi
- M. Liehr
- et al.
- 1991
- Applied Physics Letters
Surface etching and roughening in integrated processing of thermal oxides
- M. Offenberg
- M. liehr
- et al.
- 1991
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Kinetics of silicon epitaxy using SiH4 in a rapid thermal chemical vapor deposition reactor
- M. Liehr
- C.M. Greenlief
- et al.
- 1990
- Applied Physics Letters
Ultraclean, integrated processing of thermal oxide structures
- M. Offenberg
- M. Liehr
- et al.
- 1990
- Applied Physics Letters
Vapor phase hydrocarbon removal for Si processing
- Srinandan R. Kasi
- M. Liehr
- 1990
- Applied Physics Letters