Quantitative measurement of resist outgassing during exposure
- Nicolae Maxim
- Frances A. Houle
- et al.
- 2009
- SPIE Advanced Lithography 2009
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71 results for Vaughn R. Deline
Quantification of outgassing of C-, Si-, and S-containing products during exposure of photoresists
- F.A. Houle
- N. Maxim
- et al.
- 2009
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Solution processing of CIGS absorber layers using a hydrazine-based approach
- David B. Mitzi
- Min Yuan
- et al.
- 2008
- PVSC 2008
A high-efficiency solution-deposited thin-film photovoltaic device
- David B. Mitzi
- Min Yuan
- et al.
- 2008
- Advanced Materials
Direct evidence for abrupt postcrystallization germanium precipitation in thin phase-change films of Sb-15 at. % Ge
- C. Cabral
- L. Krusin-Elbaum
- et al.
- 2008
- Applied Physics Letters
Molecular-controlled fracture and release of templated nanoporous organosilicate thin films
- Markus D. Ong
- Willi Volksen
- et al.
- 2008
- Advanced Materials
Characterization of volatile species formed during exposure of photoresists to ultraviolet light
- F.A. Houle
- V.R. Deline
- et al.
- 2007
- Macromolecules
Evidence for segregation of Te in Ge2 Sb2 Te5 films: Effect on the "phase-change" stress
- L. Krusin-Elbaum
- C. Cabral
- et al.
- 2007
- Applied Physics Letters
Irreversible modification of Ge2Sb2Te5 phase change material by nanometer-thin Ti adhesion layers in a device-compatible stack
- C. Cabral Jr.
- K.N. Chen
- et al.
- 2007
- Applied Physics Letters
Biomimetic approaches for fabricating high-density nanopatterned arrays
- Jennifer N. Cha
- Yuan Zhang
- et al.
- 2007
- Chemistry of Materials