Direct determination of photoresist composition changes during UV exposure
- Frances A. Houle
- Vaughn R. Deline
- et al.
- 2006
- SPIE Advanced Lithography 2006
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71 results for Vaughn R. Deline
Photo-oxidation and the absence of photodarkening in Ge2Sb 2Te5 phase change material
- Bong-Sub Lee
- Ying Xiao
- et al.
- 2006
- MRS Spring Meeting 2006
A comparative study of SIMS depth profiling of boron in silicon
- J.B. Clegg
- A.E. Morgan
- et al.
- 2004
- Surface and Interface Analysis
Liquid immersion lithography - Evaluation of resist issues
- William Hinsberg
- Gregory Wallraff
- et al.
- 2004
- Microlithography 2004
Mechanism for bistability in organic memory elements
- L.D. Bozano
- B.W. Kean
- et al.
- 2004
- Applied Physics Letters
Clusters and magnetism in epitaxial Co-doped TiO2 anatase
- S.A. Chambers
- T. Droubay
- et al.
- 2003
- Applied Physics Letters
Hairpin Configurations of Triblock Copolymers at Homopolymer Interfaces
- T.P. Russell
- A.M. Mayes
- et al.
- 2002
- Macromolecules
Enthalpy-Driven Swelling of a Polymer Brush
- H.R. Brown
- K. Char
- et al.
- 2002
- Macromolecules
Surface-Induced Orientation of Symmetric, Diblock Copolymers: A Secondary Ion Mass Spectrometry Study
- G. Coulon
- T.P. Russell
- et al.
- 2002
- Macromolecules
Characteristics of the Surface-Induced Orientation for Symmetric Diblock PS/PMMA Copolymers
- T.P. Russell
- G. Coulon
- et al.
- 2002
- Macromolecules