200 mm wafer-scale integration of sub-20 nm sacrificial nanofluidic channels for manipulating and imaging single DNA moleculesC. WangS.W. Namet al.2013IEDM 2013
Dopant-segregation technique for leakage reduction and performance improvement in trigate transistors without raised source/drain epitaxyFei LiuZhen Zhanget al.2014IEEE Electron Device Letters
Subtractive W contact and local interconnect co-integration (CLIC)Fei LiuBenjamin Fletcheret al.2013IITC 2013
Application of cyclic fluorocarbon/argon discharges to device patterningDominik MetzlerKishore Uppireddiet al.2016JVSTA