Publications

This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.

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14 results for Brett C. Baker-O'Neal

Electromigration reliability in nanoscale Cu interconnects
- - C.-K. Hu
  - L. Gignac
  - et al.
- 2007
- MRS Fall Meeting 2007
The effect of microstructure on resistivity and reliability in copper interconnects
- - Lynne M. Gignac
  - C.-K. Hu
  - et al.
- 2007
- AMC 2007
Electromigration reliability of advanced interconnects
- - C.-K. Hu
  - L. Gignac
  - et al.
- 2007
- International Workshop on Stress-Induced Phenomena in Metallization 2007
Lower resistance scaled metal contacts to silicide for advanced CMOS
- - A. Topol
  - C. Sheraw
  - et al.
- 2006
- VLSI Technology 2006
A SiCOH BEOL interconnect technology for high density and high performance 65 nm CMOS applications
- - Matthew Angyal
  - Jason Gill
  - et al.
- 2005
- AMC 2005
Tin incorporated in copper films during damascene copper electrodeposition
- - S. Kitayaporn
  - Qiang Huang
  - et al.
- 2014
- JES
Electrochemical palladium deposition for reducing critical dimensions in nanostructures
- - Asli Sahin
  - Qiang Huang
  - et al.
- 2014
- JES
Impurities in the electroplated sub-50 nm cu lines: The effects of the plating additives
- - Qiang Huang
  - A. Avekians
  - et al.
- 2014
- JES
Electroplating of Fe-rich NiFe alloys in sub-50 nm lines
- - D. Liang
  - J. Liu
  - et al.
- 2014
- JES
An electrochemical method of suppressor screening for Cu plating in sub-100 nm lines
- - Qiang Huang
  - J. Liu
  - et al.
- 2014
- JES