Measurement of placement error between self-assembled polymer patterns and guiding chemical prepatterns
- Gregory S. Doerk
- Chi-Chun Liu
- et al.
- 2012
- SPIE Advanced Lithography 2012
Publications
This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.
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38 results for Charlie Liu
Progress towards the integration of optical proximity correction and directed self-assembly of block copolymers with graphoepitaxy
- Chi-Chun Liu
- Jed Pitera
- et al.
- 2012
- SPIE Advanced Lithography 2012
Exploration of pillar local CDU improvement options for AI applications
- Charlie Liu
- Hao Tang
- et al.
- 2020
- SPIE Advanced Lithography 2020
The One-Pot Directed Assembly of Cylinder-Forming Block Copolymer on Adjacent Chemical Patterns for Bimodal Patterning
- Tzu-Hsuan Chang
- Shisheng Xiong
- et al.
- 2017
- Macromolecular Rapid Communications
Design technology co-optimization assessment for directed self-Assembly-based lithography: Design for directed self-Assembly or directed self-Assembly for design
- Kafai Lai
- Chi Chun Liu
- et al.
- 2017
- J. Micro/Nanolithogr. MEMS MOEMS
Programmable nanoparticle ensembles via high-throughput directed self-assembly
- Qiu Dai
- Yingyu Chen
- et al.
- 2013
- Langmuir
Pattern transfer of directed self-assembly patterns for CMOS device applications
- Hsin-Yu Tsai
- Hiroyuki Miyazoe
- et al.
- 2013
- J. Micro/Nanolithogr. MEMS MOEMS
Sub-30 nm pitch line-space patterning of semiconductor and dielectric materials using directed self-assembly
- Hsin-Yu Tsai
- Hiroyuki Miyazoe
- et al.
- 2012
- Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics