Development of SiGe Indentation Process Control for Gate-All-Around FET Technology Enablement
- Daniel Schmidt
- Aron Cepler
- et al.
- 2022
- IEEE Trans Semicond Manuf
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Fundamental characterization of stochastic variation for improved single-expose extreme ultraviolet patterning at aggressive pitch
- Jennifer Church
- Luciana Meli
- et al.
- 2020
- J. Micro/Nanolithogr. MEMS MOEMS
Study of TiN and TaN underlayer properties and their influence on W growth
- Shanti Pancharatnam
- Gabriel Rodriguez
- et al.
- 2019
- IEEE Trans Semicond Manuf