Cyclic Cl2/H2 quasi-atomic layer etching approach for TiN and TaN patterning using organic masks
- Nathan Marchack
- J. M. Papalia
- et al.
- 2017
- JVSTA
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In-situ etch rate study of HfxLayOz in Cl2/BCl3 plasmas using the quartz crystal microbalance
- Nathan Marchack
- Taeseung Kim
- et al.
- 2015
- JVSTA
Feature profile evolution during shallow trench isolation etching in chlorine-based plasmas. III. the effect of oxygen addition
- Cheng-Che Hsu
- Nathan Marchack
- et al.
- 2013
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures