Combined dislocation and process modeling for local oxidation of silicon structure
- D. Chidambarrao
- X.H. Liu
- et al.
- 2002
- Journal of Applied Physics
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35 results for Dureseti Chidambarrao
The effect of current density, stripe length, stripe width, and temperature on resistance saturation during electromigration testing
- R. Filippi
- R.A. Wachnik
- et al.
- 2002
- Journal of Applied Physics
Dislocation modeling for the silicon world
- K.W. Schwarz
- X.H. Liu
- et al.
- 2001
- Materials Science and Engineering: A
Dislocation dynamics near film edges and corners in silicon
- K.W. Schwarz
- D. Chidambarrao
- 1999
- Journal of Applied Physics
Thin-film temperature rise estimates during low energy ion bombardment in a plasma reactor
- M. Naeem
- D. Chidambarrao
- 1995
- Applied Physics Letters