Nickel suicide thermal stability on polycrystalline and single crystalline siliconE.G. ColganJ.P. Gambinoet al.1996Materials Chemistry and Physics
Kinetics of Al grain growth, Al2Cu precipitation, and dissolution in blanket thin films and fine linesE.G. ColganK.P. Rodbellet al.1994Journal of Applied Physics
The role of Cu distribution and Al2Cu precipitation on the electromigration reliability of submicrometer Al(Cu) linesE.G. ColganK.P. Rodbell1994Journal of Applied Physics
Manufacturability versus reliability issues relevant to interconnect metallizationsK.P. RodbellE.G. Colganet al.1994MRS Spring Meeting 1994
Activation energy for C94 and C54 TiSi2 formation measured during rapid thermal annealingE.G. ColganL. Clevengeret al.1994Applied Physics Letters
Rapid evaluations of thin film interfacial reactions using temperature-ramped measurementsJ.M.E. HarperL. Clevengeret al.1993MRS Fall Meeting 1993
Effect of annealing on the Cu distribution and Al2Cu precipitation in Al(Cu) thin filmsE.G. ColganK.P. Rodbellet al.1993MRS Proceedings 1993