Bayesian dropout approximation in deep learning neural networks: Analysis of self-Aligned quadruple patterning
- Scott D. Halle
- Derren N. Dunn
- et al.
- 2022
- JM3
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23 results for Allen Gabor
Overlay error statistics for multiple-exposure patterning
- 2019
- J. Micro/Nanolithogr. MEMS MOEMS
Enabling the 70 nm technology node with 193 nm altPSM lithography
- Lars Liebmann
- Jennifer Lund
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- 2002
- Proceedings of SPIE-The International Society for Optical Engineering