Fundamental characterization of stochastic variation for improved single-expose extreme ultraviolet patterning at aggressive pitch
- Jennifer Church
- Luciana Meli
- et al.
- 2020
- J. Micro/Nanolithogr. MEMS MOEMS
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33 results for Martin Burkhardt
Mitigation of extreme ultraviolet mask defects by pattern shifting: Method and statistics
- Alfred Wagner
- Martin Burkhardt
- et al.
- 2012
- Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics
Patterning and characterization of large-area quantum wire arrays
- K. Ismail
- M. Burkhardt
- et al.
- 1991
- Applied Physics Letters