In situ TEM analysis of TiSi2 C49-C54 transformations during annealing
- L. Gignac
- V. Svilan
- et al.
- 1996
- MRS Fall Meeting 1996
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162 results for Cyril Cabral
In-situ X-ray diffraction analysis of TiSi2 phase formation from a titanium-molybdenum bilayer
- C. Cabral Jr.
- L. Clevenger
- et al.
- 1996
- MRS Fall Meeting 1996
Formation of a crystalline metal-rich suicide in thin film titanium/silicon reactions
- L. Clevenger
- C. Cabral Jr.
- et al.
- 1996
- Thin Solid Films
Phase formation in Cu(Sn) alloy thin films
- L. Clevenger
- B. Arcot
- et al.
- 1996
- MRS Spring Meeting 1996
Dependence of crystallographic texture of C54 TiSi2 on thickness and linewidth in submicron CMOS structures
- V. Svilan
- K.P. Rodbell
- et al.
- 1996
- MRS Spring Meeting 1996
Effect of a surface layer on the stress relaxation of thin films
- M.D. Thouless
- K.P. Rodbell
- et al.
- 1996
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Electromigration drift velocity in Al-alloy and Cu-alloy lines
- C.-K. Hu
- K.Y. Lee
- et al.
- 1996
- JES
Investigation of titanium silicide formation in Ti+Si reactions using infrared spectroscopy and x-ray diffraction
- K.L. Saenger
- C. Cabral Jr.
- et al.
- 1995
- Journal of Applied Physics
Reduction of the C54-TiSi2 phase transformation temperature using refractory metal ion implantation
- R. Mann
- G.L. Miles
- et al.
- 1995
- Applied Physics Letters
In situ analysis of the formation of thin TiSi2 (<50 nm) contacts in submicron CMOS structures during rapid thermal annealing
- L. Clevenger
- C. Cabral Jr.
- et al.
- 1995
- MRS Fall Meeting 1995