Spin-on organic hardmask for topo-patterned substrate
- Kazuhiko Komura
- Yoshi Hishiro
- et al.
- 2014
- SPIE Advanced Lithography 2014
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7 results for Tsutomu Shimokawa
Investigation of pattern wiggling for spin-on organic hardmask materials
- Goji Wakamatsu
- Kentaro Goto
- et al.
- 2012
- Proceedings of SPIE - The International Society for Optical Engineering 2012
High performance 193nm photoresists based on fluorosulfonamide
- Wenjie Li
- Kuang-Jung Chen
- et al.
- 2007
- SPIE Advanced Lithography 2007
Progress towards developing high performance immersion compatible materials and processes
- Karen Petrillo
- Kaushal Patel
- et al.
- 2005
- Microlithography 2005
193nm single layer photoresists: Defeating tradeoffs with a new class of fluoropolymers
- P.R. Varanasi
- R.W. Kwong
- et al.
- 2005
- Microlithography 2005
Design of protective topcoats for immersion lithography
- Robert D. Allen
- Phillip J. Brock
- et al.
- 2005
- J. Photopolym. Sci. Tech.
Fluoroalcohol-methacrylate resists for 193nm lithography
- P.R. Varanasi
- R.W. Kwong
- et al.
- 2005
- J. Photopolym. Sci. Tech.