Carbon nanotube scanning probe for profiling of deep-ultraviolet and 193 nm photoresist patterns
- Cattien V. Nguyen
- Ramsey M. D. Stevens
- et al.
- 2002
- Applied Physics Letters
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48 results for Carl E. Larson
Excited-state chromium atom distributions produced in the KrF* laser multiphoton dissociation of a series of chromium compounds
- George W. Tyndall
- Carl E. Larson
- et al.
- 2002
- Journal of Physical Chemistry
A Novel Copper Complex and CVD Precursor: (η2-2-Butyne)copper(I) Hexafluoroacetylacetonate
- Thomas H. Baum
- Carl E. Larson
- 2002
- Chemistry of Materials
Mechanistic studies of the acidolysis reactions occurring in silicon-containing bilayer photoresists
- Ilya Zharov
- Josef Michl
- et al.
- 2002
- Chemistry of Materials
Characterization and acid diffusion measurements of new strong acid photoacid generators
- G.M. Wallraff
- Carl E. Larson
- et al.
- 2002
- Proceedings of SPIE-The International Society for Optical Engineering
Aliphatic platforms for the design of 157 nm chemically amplified resists
- Hiroshi Ito
- Hoa D. Truong
- et al.
- 2002
- Proceedings of SPIE-The International Society for Optical Engineering
Carbon nanotube scanning probe for surface profiling of DUV and 193 nm photoresist pattern
- Cattien V. Nguyen
- Ramsey M. D. Stevens
- et al.
- 2002
- Proceedings of SPIE-The International Society for Optical Engineering
IBM 193nm bilayer resist: Materials, lithographic performance and optimization
- Ranee Kwong
- P. Rao Varanasi
- et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
Characterization of new aromatic polymers for 157 nm photoresist applications
- N. Fender
- P.J. Brock
- et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
Development of 157 nm positive resists
- Hiroshi Ito
- G.M. Wallraff
- et al.
- 2001
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures