Determination of coupled acid catalysis-diffusion processes in a positive-tone chemically amplified photoresist
- F.A. Houle
- W.D. Hinsberg
- et al.
- 2000
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
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48 results for Carl E. Larson
Approaches to etch resistant 193-nm photoresists: Performance and prospects
- R.D. Allen
- Juliann Opitz
- et al.
- 1999
- SPIE Advances in Resist Technology and Processing 1999
Poly(1,4-phenyleneazine N,N-dioxide): A Recyclable Material for a Solventless Laser-Imageable Resist Process
- Thomas H. Baum
- Carl E. Larson
- et al.
- 1994
- Chemistry of Materials
Chemical Vapor Deposited Copper from Alkyne Stabilized Copper (I) Hexafluoroacetylacetonate Complexes
- Thomas H. Baum
- Carl E. Larson
- 1993
- JES
Ligand-stabilized copper(I) hexafluoroacetylacetonate complexes: NMR spectroscope and the nature of the copper-alkene bond
- Thomas H. Baum
- Carl E. Larson
- et al.
- 1992
- Journal of Organometallic Chemistry
Chemical vapor deposition of copper from 1,5-cyclooctadiene copper(I) hexafluoroacetylacetonate
- Scott K. Reynolds
- Christopher J. Smart
- et al.
- 1991
- Applied Physics Letters
Laser-induced chemical vapor deposition of aluminum
- Thomas H. Baum
- Carl E. Larson
- et al.
- 1989
- Applied Physics Letters
Laser-induced chemical vapor deposition of high-purity metals
- T.H. Baum
- Carl E. Larson
- 1988
- High temperature science