Hexafluoroalcohol (HFA) containing molecular resist materials for high resolution lithographic applications
- Anuja De Silva
- Linda K. Sundberg
- et al.
- 2011
- SPIE Advanced Lithography 2011
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Nanoscale three-dimensional patterning of molecular resists by scanning probes
- David Pires
- James L. Hedrick
- et al.
- 2010
- Science
A fundamental study on dissolution behavior of high-resolution molecular glass photoresists
- Anuja De Silva
- Linda K. Sundberg
- et al.
- 2008
- Chemistry of Materials