Nanoscale three-dimensional patterning of molecular resists by scanning probes
- David Pires
- James L. Hedrick
- et al.
- 2010
- Science
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32 results for Anuja De Silva
EUV single exposure via patterning at aggressive pitch
- Jing Guo
- Jennifer Church
- et al.
- 2021
- SPIE Advanced Lithography 2021
Leveraging sub-E0 dose assessment methodology to improve EUV lithography cluster dose performance
- Chris Robinson
- Cody Murray
- et al.
- 2020
- SPIE Advanced Lithography 2020
EUV chemically amplified resist component distribution and efficiency for stochastic defect control
- Dario Goldfarb
- Olivia Wang
- et al.
- 2020
- SPIE Advanced Lithography 2020
Material and process improvements towards sub 36nm pitch EUV single exposure
- Karen Petrillo
- Dave Hetzer
- et al.
- 2019
- ANTS 2019
Investigation of mask absorber induced image shift in EUV lithography
- Martin Burkhardt
- Anuja De Silva
- et al.
- 2019
- SPIE Advanced Lithography 2019
Fundamentals of resist stochastics effect for single-expose EUV patterning
- Anuja De Silva
- Luciana Meli
- et al.
- 2019
- SPIE Advanced Lithography 2019
Study of resist hardmask interaction through surface activation layers
- Anuja De Silva
- Luciana Meli
- et al.
- 2018
- EUVL 2018
On thermal interface materials with polydisperse fillers: Packing algorithm and effective properties
- Piyas Chowdhury
- Anuja De Silva
- et al.
- 2018
- InterPACK 2018
Polymer brush as adhesion promoter for EUV patterning
- Jing Guo
- Anuja De Silva
- et al.
- 2018
- SPIE Advanced Lithography 2018