Determination of the internal morphology of nanostructures patterned by directed self assembly
- Daniel F. Sunday
- Matthew R. Hammond
- et al.
- 2014
- ACS Nano
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28 results for Wen-Li Wu
Dissolution fundamentals of 193-nm methacrylate based photoresists
- Ashwin Rao
- Shuhui Kang
- et al.
- 2006
- SPIE Advanced Lithography 2006
Interfacial structure of photoresist thin films in developer solutions
- Vivek M. Prabhu
- Bryan D. Vogt
- et al.
- 2005
- Microlithography 2005
Cross section and critical dimension metrology in dense high aspect ratio patterns with CD-SAXS
- Ronald L. Jones
- Eric K. Lin
- et al.
- 2005
- International Conference on Characterization and Metrology for ULSI Technology 2005
Preliminary evaluation of line edge roughness metrology based on CD-SAXS
- Ronald L. Jones
- Tengjiao Hu
- et al.
- 2004
- SPIE Advanced Lithography 2004
Measurements of water distribution in thin lithographic films
- Bryan D. Vogt
- Christopher L. Soles
- et al.
- 2004
- Microlithography 2004
Fundamentals of developer-resist interactions for line-edge roughness and critical dimension control in model 248 nm and 157 nm photoresists
- Vivek M. Prabhu
- Michael X. Wang
- et al.
- 2004
- Microlithography 2004
Polymer dynamics and diffusive properties in ultra-thin photoresist films
- Christopher L. Soles
- Ronald L. Jones
- et al.
- 2003
- Microlithography 2003
Deprotection volume characteristics and line edge morphology in chemically amplified resists
- Ronald L. Jones
- Tengjiao Hu
- et al.
- 2003
- Microlithography 2003
X-ray absorption spectroscopy to probe interfacial issues in photolithography
- Joseph L. Lenhart
- Daniel A. Fischer
- et al.
- 2003
- Microlithography 2003