Publications

This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.

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41 results for Philip L. Flaitz

90 nm SiCOH technology in 300 mm manufacturing
- - L. Clevenger
  - M. Yoon
  - et al.
- 2004
- ADMETA 2004
Comprehensive reliability evaluation of a 90 nm CMOS technology with Cu/PECVD low-k BEOL
- - D. Edelstein
  - H.S. Rathore
  - et al.
- 2004
- IRPS 2004
Comprehensive reliability evaluation of a 90 nm CMOS technology with Cu/PECVD low-k BEOL
- - D. Edelstein
  - H.S. Rathore
  - et al.
- 2004
- IRPS 2004
Integration of 1GB/sec Silicon Lateral Trench Photodetector with High-Performance CMOS
- - M. Yang
  - J. Schaub
  - et al.
- 2003
- VLSI Technology 2003
Formation of Si:CP layer through in-situ doping and implantation process for n-type metal-oxide-semiconductor devices
- - Shogo Mochizuki
  - Rainer Loesing
  - et al.
- 2014
- Thin Solid Films
Cu reflows on Ru
- - C.-C. Yang
  - Baozhen Li
  - et al.
- 2013
- ECS Solid State Letters
Co capping layers for Cu/low-k interconnects
- - C.-C. Yang
  - P. Flaitz
  - et al.
- 2012
- Microelectronic Engineering
Effect of Zn doping on SnAg solder microstructure and electromigration stability
- - Minhua Lu
  - Da-Yuan Shih
  - et al.
- 2009
- Journal of Applied Physics
Impurity measurements in silicon with D-SIMS and atom probe tomography
- - P.A. Ronsheim
  - P. Flaitz
  - et al.
- 2008
- Applied Surface Science
Property modifications of nanoporous pSiCOH dielectrics to enhance resistance to plasma-induced damage
- - E. Todd Ryan
  - Stephen M. Gates
  - et al.
- 2008
- Journal of Applied Physics