Molecular design for stabilization of chemical amplification resist toward airborne contamination
- Hiroshi Ito
- William P. England
- et al.
- 1993
- Microlithography 1993
Publications
Date
Featured collections
Popular topics
120 results for William D. Hinsberg
The influence of residual casting solvent on the dissolution behavior of diazonaphthoquinone resists
- V. Rao
- W.D. Hinsberg
- et al.
- 1993
- Microlithography 1993
Approach toward environmental stabilization of chemical amplification resists
- Hiroshi Ito
- William P. England
- et al.
- 1993
- J. Photopolym. Sci. Tech.
Fundamental studies of airborne chemical contamination of chemically amplified resists
- W.D. Hinsberg
- Scott A. MacDonald
- et al.
- 1993
- J. Photopolym. Sci. Tech.
Airborne Contamination of a Chemically Amplified Resist. 1. Identification of Problem
- Scott A. MacDonald
- William D. Hinsberg
- et al.
- 1993
- Chemistry of Materials
Designing high performance KrF and ArF single layer resists with methacrylate polymers
- Robert D. Allen
- Gregory M. Wallraff
- et al.
- 1993
- J. Photopolym. Sci. Tech.
Chemically amplified photoresist for visible laser direct imaging
- G.M. Wallraff
- R.D. Allen
- et al.
- 1991
- ACS Spring 1991
Methacrylate terpolymer approach in the design of a family of chemically amplified positive resists
- R.D. Allen
- G.M. Wallraff
- et al.
- 1991
- ACS Spring 1991
Influence of residual solvent on the absorption of N-methylpyrrolidone by polymer films
- W.D. Hinsberg
- Scott A. MacDonald
- et al.
- 1991
- ACS Spring 1991
Quantitation of airborne chemical contamination of chemically amplified resists using radiochemical analysis
- W.D. Hinsberg
- Scott A. MacDonald
- et al.
- 1992
- Microlithography 1992