Determination of coupled acid catalysis-diffusion processes in a positive-tone chemically amplified photoresist
- F.A. Houle
- W.D. Hinsberg
- et al.
- 2000
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
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120 results for William D. Hinsberg
Silyl-protected hydroxystyrenes: living anionic polymerization at room temperature and selective desilylation
- Hiroshi Ito
- Arno Knebelkamp
- et al.
- 2000
- J Polym Sci Part A
Mechanism of phenolic polymer dissolution: importance of acid-base equilibria
- Lewis W. Flanagin
- Christopher L. McAdams
- et al.
- 1999
- Macromolecules
Lithographic Imaging Techniques for the Formation of Nanoscopic Features
- G.M. Wallraff
- W.D. Hinsberg
- 1999
- Chemical Reviews
Liquid immersion deep-ultraviolet interferometric lithography
- J. Hoffnagle
- W.D. Hinsberg
- et al.
- 1999
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Deep-ultraviolet interferometric lithography as a tool for assessment nf chemically amplified photoresist performance
- W.D. Hinsberg
- F.A. Houle
- et al.
- 1998
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
The mechanism of phenolic polymer dissolution: A new perspective
- Pavlos C. Tsiartas
- Lewis W. Flanagin
- et al.
- 1997
- Macromolecules
Mechanistic studies of chemically amplified photoresists
- W.D. Hinsberg
- G.M. Wallraff
- et al.
- 1997
- American Chemical Society, Polymer Preprints, Division of Polymer Chemistry
DNA sequencing on a chip
- G.M. Wallraff
- T. Nguyen
- et al.
- 1997
- CHEMTECH
Thick film positive photoresist: development and resolution enhancement technique
- D.R. McKean
- T.P. Russell
- et al.
- 1995
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures