Use of interferometric lithography to characterize the spatial resolution of a photoresist film
- John A. Hoffnagle
- William D. Hinsberg
- et al.
- 2003
- J. Photopolym. Sci. Tech.
Publications
This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.
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120 results for William D. Hinsberg
Lithographic techniques for the fabrication of oligonucleotide arrays
- G.M. Wallraff
- W.D. Hinsberg
- et al.
- 2000
- J. Photopolym. Sci. Tech.
Factors controlling pattern formation in chemically amplified resists at sub-100 nm dimensions
- W.D. Hinsberg
- F.A. Houle
- et al.
- 1999
- J. Photopolym. Sci. Tech.
Stochastic simulation of heat flow with application to laser-solid interactions
- F.A. Houle
- W.D. Hinsberg
- 1998
- Applied Physics A: Materials Science and Processing
Fundamental studies of airborne chemical contamination of chemically amplified resists
- W.D. Hinsberg
- Scott A. MacDonald
- et al.
- 1993
- J. Photopolym. Sci. Tech.
Designing high performance KrF and ArF single layer resists with methacrylate polymers
- Robert D. Allen
- Gregory M. Wallraff
- et al.
- 1993
- J. Photopolym. Sci. Tech.
Approach toward environmental stabilization of chemical amplification resists
- Hiroshi Ito
- William P. England
- et al.
- 1993
- J. Photopolym. Sci. Tech.
Alkylated poly(4-hydroxystyrene) derivatives for deep ultraviolet lithography
- D.R. McKean
- W.D. Hinsberg
- et al.
- 1992
- J. Photopolym. Sci. Tech.
Contribution of EUV resist counting statistics to stochastic printing failures
- William D. Hinsberg
- Gregory M. Wallraff
- et al.
- 2021
- JM3
Measurement of Thin-Film Dissolution Kinetics using a Quartz Crystal Microbalance
- W.D. Hinsberg
- C.G. Willson
- et al.
- 2019
- JES