Fundamental study of extreme UV resist line edge roughness: Characterization, experiment, and modeling
- Ramakrishnan Ayothi
- Lovejeet Singh
- et al.
- 2012
- Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics
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101 results for Gregory M. Wallraff
Bound PAG resists: An EUV and electron beam lithography performance comparison of fluoropolymers
- Luisa D. Bozano
- Phillip J. Brock
- et al.
- 2011
- SPIE Advanced Lithography 2011
Visualization of the develop process
- Linda K. Sundberg
- Gregory M. Wallraff
- et al.
- 2011
- SPIE Advanced Lithography 2011
Two complementary methods to characterize long range proximity effects due to develop loading
- Linda K. Sundberg
- Greg M. Wallraff
- et al.
- 2010
- SPIE Photomask Technology + EUV Lithography 2010
A method to characterize pattern density effects: Chemical flare and develop loading
- Linda K. Sundberg
- Gregory M. Wallraff
- et al.
- 2010
- Proceedings of SPIE - The International Society for Optical Engineering 2010
Large-area spatially ordered arrays of gold nanoparticles directed by lithographically confined DNA origami
- Albert M. Hung
- Christine M. Micheel
- et al.
- 2009
- Nature Nanotechnology
Investigation of polymer-bound PAGs: Synthesis, characterization and initial structure/property relationships of anion-bound resists
- Robert D. Allen
- Phillip J. Brock
- et al.
- 2009
- J. Photopolym. Sci. Tech.
Placement and orientation of individual DNA shapes on lithographically patterned surfaces
- Ryan J. Kershner
- Luisa D. Bozano
- et al.
- 2009
- Nature Nanotechnology
Solution photochemistry of poly(dialkylsilanes): A new class of photoresists
- Josef Michl
- John W. Downing
- et al.
- 2009
- Pure and Applied Chemistry
Measurements of acid generation by extreme ultraviolet irradiation in lithographic films
- Martin Glodde
- Dario L. Goldfarb
- et al.
- 2007
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures