Publications

This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.

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101 results for Gregory M. Wallraff

Sub-50 nm half-pitch imaging with a low activation energy chemically amplified photoresist
- - G.M. Wallraff
  - D. Medeiros
  - et al.
- 2004
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Combinatorial resist processing studies
- - Carl E. Larson
  - Gregory M. Wallraff
- 2004
- Microlithography 2004
Optimized acid release underlayers for 157 nm lithography
- - Carl E. Larson
  - G.M. Wallraff
  - et al.
- 2004
- Microlithography 2004
IBM-JSR 193nm negative tone resist: Polymer design, material properties, and lithographic performance
- - Kaushal Patel
  - Margaret Lawson
  - et al.
- 2004
- Microlithography 2004
Liquid immersion lithography - Evaluation of resist issues
- - William Hinsberg
  - Gregory Wallraff
  - et al.
- 2004
- Microlithography 2004
Impact of thin resist processes on post-etch LER
- - Arpan P. Mahorowala
  - Dario L. Goldfarb
  - et al.
- 2003
- Microlithography 2003
Extendibility of chemically amplified amplified resists: Another brick wall?
- - William Hinsberg
  - Frances Houle
  - et al.
- 2003
- Microlithography 2003
Fluoropolymer platforms for 157 nm resist applications
- - Hiroshi Ito
  - G.M. Wallraff
  - et al.
- 2001
- International Conference on Microprocesses and Nanotechnology 2001
193 nm positive tone bilayer resist based on norbornene-maleic anhydride copolymers
- - R. Sooriyakumaran
  - D. Fenzel-Alexander
  - et al.
- 2000
- Microlithography 2000
Effect of resist components on image spreading during postexposure bake of chemically amplified resists
- - W.D. Hinsberg
  - F.A. Houle
  - et al.
- 2000
- Microlithography 2000