Publications

33 results for C. J. Penny

Lower-k SiCOH integration for 65 nm ground rules
- - T. Nogami
  - S. Lane
  - et al.
- 2005
- VMIC 2005
Low-k/copper integration scheme suitable for ULSI manufacturing from 90nm to 45nm nodes
- - T. Nogami
  - S. Lane
  - et al.
- 2005
- Optics East 2005
High performance 65 nm SOI technology with dual stress liner and low capacitance SRAM cell
- - E. Leobandung
  - H. Nayakama
  - et al.
- 2005
- VLSI Technology 2005