Aliphatic platforms for the design of 157 nm chemically amplified resists
- Hiroshi Ito
- Hoa D. Truong
- et al.
- 2002
- Proceedings of SPIE-The International Society for Optical Engineering
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54 results for Dolores Miller
Fluoropolymers for 157/193 nm lithography: Chemistry, new platform, formulation strategy, and lithographic evaluation
- Hiroshi Ito
- H.D. Truong
- et al.
- 2002
- J. Photopolym. Sci. Tech.
Experimental studies on electrodeposition of CoFe alloys
- Hong Xu
- Thomas E. Dinan
- et al.
- 2000
- ECS Meeting 2000
Polymer design for 157 nm chemically amplified resists
- Hiroshi Ito
- Greg M. Wallraff
- et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
Industrial/academic internships at IBM-almaden under NSF programs
- Charles G. Wade
- Dolores Miller
- et al.
- 2001
- MRS Spring Meeting 2001
Novel fluoropolymers for use in 157 nm lithography
- Hiroshi Ito
- G.M. Wallraff
- et al.
- 2001
- J. Photopolym. Sci. Tech.
Investigation of the radical copolymerization and terpolymerization of maleic anhydride and norbornenes by an in situ 1H NMR analysis of kinetics and by the mercury method: Evidence for the lack of charge-transfer-complex propagation
- Hiroshi Ito
- Dolores Miller
- et al.
- 2000
- J Polym Sci Part A
Conformational analysis of alkylated biuret and triuret: Evidence for helicity and helical inversion in oligoisocyanates
- Joshua Roth
- Daniel J. O'Leary
- et al.
- 2000
- Organic Letters
Kinetics and reactivities in radical copolymerization of maleic anhydride and norbornenes
- Hiroshi Ito
- Dolores Miller
- et al.
- 2000
- American Chemical Society, Polymer Preprints, Division of Polymer Chemistry
Microstructure of polyisocyanates in solution by NMR studies of well defined oligomers
- Charles G. Wade
- Daniel J. O'Leary
- et al.
- 2000
- American Chemical Society, Polymer Preprints, Division of Polymer Chemistry