New methodologies for measuring film thickness, coverage, and topography
- C. Mathew Mate
- Bing K. Yen
- et al.
- 2000
- IEEE Transactions on Magnetics
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54 results for Dolores Miller
Fundamental aspects of norbornene-maleic anhydride co- and terpolymers for 193 nm lithography: Polymerization chemistry and polymer properties
- Hiroshi Ito
- Dolores C. Miller
- et al.
- 2000
- J. Photopolym. Sci. Tech.
Nuclear magnetic resonance quantum computing using liquid crystal solvents
- Costantino S. Yannoni
- Mark H. Sherwood
- et al.
- 1999
- Applied Physics Letters
Titanium carbide etching in high density plasma
- R. Hsiao
- D.C. Miller
- et al.
- 1999
- Applied Surface Science
Electrical and photoinduced degradation of polyfluorene based films and light-emitting devices
- V.N. Bliznyuk
- S.A. Carter
- et al.
- 1998
- Macromolecules
Mechanism for ion beam passivation of copper surfaces
- A.J. Kellock
- M.H. Tabacniks
- et al.
- 1997
- Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms
Tantalum plasma etching with minimum effect on underlying nickel-iron thin film
- R. Hsiao
- D.C. Miller
- et al.
- 1997
- Thin Solid Films
Etching of tantalum in fluorine-containing high density plasmas
- R. Hsiao
- D.C. Miller
- 1996
- JES
UV laser deposition of thin films at 248 NM for phase shifting mask repair
- Janos Farkas
- P.B. Comita
- et al.
- 1994
- MRS Fall Meeting 1994
Effects of deposition temperature on the giant magnetoresistance of as-deposited Ag-Co thin films
- W.-Y. Lee
- V.R. Deline
- et al.
- 1993
- Journal of Applied Physics