Publications

This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.

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19 results for R. Murphy

Improvement of RC performance for advanced ULK/Cu interconnects with CVD hybrid dielectric/metal liner
- - M. Tagami
  - C.-C. Yang
  - et al.
- 2011
- IITC/MAM 2011
CVD Co and its application to Cu damascene interconnections
- - Takeshi Nogami
  - J. Maniscalco
  - et al.
- 2010
- IITC 2010
Low-temperature epitaxial growth of Si, SiGe, Ge, and SiC in a 300mm UHV/CVD reactor
- - Thomas N. Adam
  - Stephen W. Bedell
  - et al.
- 2010
- ECS Transactions
Process and electrical characteristics of MO-ALD HfO₂ films for high-K gate applications grown in a production-worthy 300 mm deposition system
- - R.D. Clark
  - C.S. Wajda
  - et al.
- 2007
- ECS Meeting 2007
An overview of 300mm SOI starting wafer quality and its yield detractors
- - Pei Y. Tsai
  - Marlene Almonte
  - et al.
- 2005
- ISTFA 2005
A hydrogen pre-bake process for Si epitaxy on sige surface
- - H. Chen
  - S.W. Bedell
  - et al.
- 2004
- ECS Meeting 2004
Characterization of DI water/O₃ oxidation of Si (100) and Si (111) surfaces by OCP measurements
- - H. Okorn-Schmidt
  - C. D'Emic
  - et al.
- 2000
- Diffusion and Defect Data Pt.B: Solid State Phenomena
Electrodeposited Cu film morphology on thin PVD Cu seed layers
- - James Kelly
  - X. Lin
  - et al.
- 2013
- JES
Qualification of 300 mm SOI CMOS substrate material: Readiness for development and manufacturing
- - H.J. Hovel
  - M. Almonte
  - et al.
- 2004
- Solid-State Electronics