Publications

This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.

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48 results for E. Simonyi

An alternative low resistance MOL technology with electroplated rhodium as contact plugs for 32nm CMOS and beyond
- - I. Shao
  - J.M. Cotte
  - et al.
- 2007
- IITC 2007
A porous SiCOH dielectric with k=2.4 for high performance BEOL interconnects
- - S. Gates
  - A. Grill
  - et al.
- 2006
- ADMETA 2006
Laser spike annealing: A novel post-porosity treatment for significant toughening of low-k organosilicates
- - Willi Volksen
  - Geraud Dubois
  - et al.
- 2006
- IITC 2006
Laser spike annealing: A novel post-porosity treatment for toughening of low-k organosilicates
- - Willi Volksen
  - Geraud Dubois
  - et al.
- 2006
- VMIC 2006
65nm Cu integration and interconnect reliability in low stress K=2.75 SiCOH
- - V. McGahay
  - G. Bonilla
  - et al.
- 2006
- IITC 2006
PECVD Low-k (∼2.7) dielectric SiCOH film development and integration for 65 nm CMOS devices
- - K. Ida
  - S. Nguyen
  - et al.
- 2005
- AMC 2005
New spin-on oxycarbosilane low-k dielectric materials with exceptional mechanical properties
- - Dubois Geraud
  - Teddie Magbitang
  - et al.
- 2005
- IITC 2005
Low-k/copper integration scheme suitable for ULSI manufacturing from 90nm to 45nm nodes
- - T. Nogami
  - S. Lane
  - et al.
- 2005
- Optics East 2005
Lower-k SiCOH integration for 65 nm ground rules
- - T. Nogami
  - S. Lane
  - et al.
- 2005
- VMIC 2005
Mechanical and dielectric characterization of low-k, porous organosilicates
- - Willi Volksen
  - Teddie P. Magbitang
  - et al.
- 2005
- VMIC 2005