Publications

This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.

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48 results for E. Simonyi

Reliability, yield, and performance of a 90 nm SOI/Cu/SiCOH technology
- - D. Edelstein
  - C.R. Davis
  - et al.
- 2004
- IITC 2004
Optimization of SiCOH dielectrics for integration in a 90 nm CMOS technology
- - A. Grill
  - D. Edelstein
  - et al.
- 2004
- IITC 2004
Comprehensive reliability evaluation of a 90 nm CMOS technology with Cu/PECVD low-k BEOL
- - D. Edelstein
  - H.S. Rathore
  - et al.
- 2004
- IRPS 2004
Comprehensive reliability evaluation of a 90 nm CMOS technology with Cu/PECVD low-k BEOL
- - D. Edelstein
  - H.S. Rathore
  - et al.
- 2004
- IRPS 2004
Analysis of an extreme low-κ organosilicate dielectric film exposed to representative plasmas and to a restorative process
- - M. Colburn
  - S.V. Nitta
  - et al.
- 2003
- AMC 2003
Parameters associated with fabrication of an improved direct negative and plate: Methods and measurements
- - K. Pennington
  - E. Simonyi
  - et al.
- 1989
- SPIE OE/LASE 1989
Improved materials for fabrication of direct negatives and plates by electro-erosion printing
- - A. Afzali
  - M. Desai
  - et al.
- 1989
- SPIE OE/LASE 1989
Enhanced grain growth of electroplated copper on cobalt-containing seed layer
- - Q. Huang
  - B.C. Baker-O'Neal
  - et al.
- 2013
- JES
Effects of silylation on fracture and mechanical properties of mesoporous silica films interfaced with copper
- - D.D. Gandhi
  - B. Singh
  - et al.
- 2009
- Journal of Applied Physics
Pore orientation and silylation effects on mesoporous silica film properties
- - A.P. Singh
  - D.D. Gandhi
  - et al.
- 2009
- Applied Physics Letters