A manufacturable dual channel (Si and SiGe) high-k metal gate CMOS technology with multiple oxides for high performance and low power applications
- S. Krishnan
- U. Kwon
- et al.
- 2011
- IEDM 2011
Publications
This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.
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12 results for N. Moumen
Gate length scaling and high drive currents enabled for high performance SOI technology using high-κ/metal gate
- K. Henson
- H. Bu
- et al.
- 2008
- IEDM 2008
Exploring the limits of concentration for UHCPV
- Brent A. Wacaser
- Peter D. Kirchner
- et al.
- 2011
- PVSC 2011
Wire-textured silicon solar cells
- Kejia Wang
- Oki Gunawan
- et al.
- 2010
- PVSC 2010
Multi receiver concentrator photovoltaic testing at extreme concentrations
- Theodore Van Kessel
- Ayman Abduljabar
- et al.
- 2010
- PVSC 2010
Concentrator photovoltaic reliability testing at extreme concentrations up to 2000 suns
- Theodore Van Kessel
- Ayman Abduljabar
- et al.
- 2009
- PVSC 2009
High-κ/metal gate low power bulk technology - Performance evaluation of standard CMOS logic circuits, microprocessor critical path replicas, and SRAM for 45nm and beyond
- D.-G. Park
- K. Stein
- et al.
- 2009
- VLSI-TSA 2009
A cost effective 32nm high-K/metal gate CMOS technology for low power applications with single-metal/gate-first process
- X. Chen
- S. Samavedam
- et al.
- 2008
- VLSI Technology 2008
High-performance high-κ/metal gates for 45nm CMOS and beyond with gate-first processing
- M. Chudzik
- B. Doris
- et al.
- 2007
- VLSI Technology 2007
Giant piezoresistive On/Off ratios in rare-earth chalcogenide thin films enabling nanomechanical switching
- Matthew Copel
- Marcelo A. Kuroda
- et al.
- 2013
- Nano Letters