Metastable ferroelectricity driven by depolarization fields in ultrathin Hf0.5Zr0.5O2
- Nikitas Siannas
- Christina Zacharaki
- et al.
- 2022
- Communications Physics
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6 results for P. Tsipas
Gate dielectrics for high mobility semiconductors
- A. Dimoulas
- Y. Panayiotatos
- et al.
- 2008
- ECS Meeting 2008
Current challenges in Ge MOS technology
- A. Dimoulas
- M. Houssa
- et al.
- 2006
- ECS Meeting 2006
Reliability aspects of ferroelectric TiN/Hf0.5Zr0.5O2/Ge capacitors grown by plasma assisted atomic oxygen deposition
- C. Zacharaki
- P. Tsipas
- et al.
- 2020
- Applied Physics Letters
Very high- κ ZrO2 with La2O3 (LaGeOx) passivating interfacial layers on germanium substrates
- G. Mavrou
- P. Tsipas
- et al.
- 2008
- Applied Physics Letters
Germanium-induced stabilization of a very high- k zirconia phase in ZrO2 / GeO2 gate stacks
- P. Tsipas
- S.N. Volkos
- et al.
- 2008
- Applied Physics Letters