Publications

This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.

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14 results for Rich Wise

Integrated non-SO ₂ underlayer and improved line-edge-roughness dielectric etch process using 193 nm bilayer resist
- - Parijat Bhatnagar
  - Siddhartha Panda
  - et al.
- 2006
- Applied Physics Letters
Etching silicon-containing bilayer resists in ammonia-based plasmas
- - Siddhartha Panda
  - Richard Wise
  - et al.
- 2005
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Tunable anti-reflective coatings with built-in hard mask properties facilitating thin resist processing
- - Arpan P. Mahorowala
  - Katherina Babich
  - et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
Plasma-etching processes for ULSI semiconductor circuits
- - M. Armacost
  - P.D. Hoh
  - et al.
- 1999
- IBM J. Res. Dev