Deposited ALD SiO2 high-k/metal gate interface for high voltage analog and I/O devices on next generation alternative channels and FINFET device structures
- S. Siddiqui
- M.M. Chowdhury
- et al.
- 2013
- ECS Meeting 2013
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Single wafer cleaning lessons in advanced node gate module development
- David F. Hilscher
- Daniel Jaeger
- et al.
- 2013
- ASMC 2013