Dual stress liner enhancement in hybrid orientation technology
- C. Sheraw
- M. Yang
- et al.
- 2005
- VLSI Technology 2005
Publications
Date
Featured collections
Popular topics
24 results for D. Fried
High performance 65 nm SOI technology with enhanced transistor strain and advanced-low-K BEOL
- W.-H. Lee
- A. Waite
- et al.
- 2005
- IEDM 2005
Integration and optimization of embedded-SiGe, compressive and tensile stressed liner films, and stress memorization in advanced SOI CMOS technologies
- M. Horstmann
- A. Wei
- et al.
- 2005
- IEDM 2005
Stable SRAM cell design for the 32 nm node and beyond
- Leland Chang
- David M. Fried
- et al.
- 2005
- VLSI Technology 2005
Looking into the crystal ball: Future device learning using hybrid E-beam and optical lithography
- S.E. Steen
- S.J. McNab
- et al.
- 2005
- Microlithography 2005
Aggressively scaled (0.143 μm 2) 6T-SRAM cell for the 32 nm node and beyond
- D. Fried
- J. Hergenrother
- et al.
- 2004
- IEDM 2004
A Simplified Hybrid Orientation Technology (SHOT) for high performance CMOS
- B. Doris
- Y. Zhang
- et al.
- 2004
- VLSI Technology 2004
On the integration of CMOS with hybrid crystal orientations
- M. Yang
- V. Chan
- et al.
- 2004
- VLSI Technology 2004
Scaling beyond the 65 nm node with FinFET-DGCMOS
- E. Nowak
- T. Ludwig
- et al.
- 2003
- CICC 2003
A Fin-type independent-double-gate NFET
- D. Fried
- E. Nowak
- et al.
- 2003
- Device Research Conference 2003