Nanowire metal-oxide-semiconductor field effect transistor with doped epitaxial contacts for source and drain
- G.M. Cohen
- M.J. Rooks
- et al.
- 2007
- Applied Physics Letters
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178 results for Wilfried Haensch
Challenges and opportunities for high performance 32 nm CMOS technology
- J. Sleight
- I. Lauer
- et al.
- 2006
- IEDM 2006
Investigation of FinFET devices for 32nm technologies and beyond
- H. Shang
- L. Chang
- et al.
- 2006
- VLSI Technology 2006
Ultra-thin SOI CMOS using laser spike anneal
- Zhibin Ren
- J. Sleight
- et al.
- 2006
- VLSI-TSA 2006
VDD scaling for FinFET logic and memory circuits: The impact of process variations and SRAM stability
- C.-H. Lin
- K. Das
- et al.
- 2006
- VLSI-TSA 2006
Structure, design and process control for Cu bonded interconnects in 3D integrated circuits
- Kuan-Neng Chen
- Sang Hwui Lee
- et al.
- 2006
- IEDM 2006
Improved manufacturability of Cu bond pads and implementation of seal design in 3D integrated circuits and packages
- K.N. Chen
- C. Tsang
- et al.
- 2006
- VMIC 2006
Silicon CMOS devices beyond scaling
- Wilfried Haensch
- Edward J. Nowak
- et al.
- 2006
- IBM J. Res. Dev
High-performance CMOS variability in the 65-nm regime and beyond
- Kerry Bernstein
- David J. Frank
- et al.
- 2006
- IBM J. Res. Dev
Optimizing CMOS technology for maximum performance
- David J. Frank
- Wilfried Haensch
- et al.
- 2006
- IBM J. Res. Dev