Etch selectivity of 4SiMA: Hydroxystyrene based copolymers. silicon chemistry for bilayer resist systems
- G.M. Wallraff
- Carl E. Larson
- et al.
- 1998
- J. Photopolym. Sci. Tech.
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76 results for R. Sooriyakumaran
The influence of photoacid structure on the design and performance of 193-nm resists
- Robert D. Allen
- Juliann Opitz
- et al.
- 1997
- J. Photopolym. Sci. Tech.
Approach toward environmental stabilization of chemical amplification resists
- Hiroshi Ito
- William P. England
- et al.
- 1993
- J. Photopolym. Sci. Tech.
Enhancing water permeability of fouling-resistant POSS-PEGM hydrogels using 'addition-extraction' of sacrificial additives
- Young-Hye La
- Ratnam Sooriyakumaran
- et al.
- 2012
- Journal of Membrane Science
Bifunctional hydrogel coatings for water purification membranes: Improved fouling resistance and antimicrobial activity
- Young-Hye La
- Bryan D. McCloskey
- et al.
- 2011
- Journal of Membrane Science
Novel thin film composite membrane containing ionizable hydrophobes: PH-dependent reverse osmosis behavior and improved chlorine resistance
- Young-Hye La
- Ratnam Sooriyakumaran
- et al.
- 2010
- Journal of Materials Chemistry
Integration of photo-patternable low-κ material into advanced Cu back-end-of-the-line
- Qinghuang Lin
- Alshakim Nelson
- et al.
- 2010
- Japanese Journal of Applied Physics
A fundamental study on dissolution behavior of high-resolution molecular glass photoresists
- Anuja De Silva
- Linda K. Sundberg
- et al.
- 2008
- Chemistry of Materials
Characterization of volatile species formed during exposure of photoresists to ultraviolet light
- F.A. Houle
- V.R. Deline
- et al.
- 2007
- Macromolecules
Antiadhesion considerations for UV nanoimprint lithography
- F.A. Houle
- C.T. Rettner
- et al.
- 2007
- Applied Physics Letters