Approaches to etch resistant 193-nm photoresists: Performance and prospects
- R.D. Allen
- Juliann Opitz
- et al.
- 1999
- SPIE Advances in Resist Technology and Processing 1999
Publications
This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.
Date
Featured collections
Popular topics
76 results for R. Sooriyakumaran
Development of an incremental structural parameter model for predicting reactive ion etch rates of 193 nm photoresist polymers
- Thomas I. Wallow
- P.J. Brock
- et al.
- 1999
- SPIE Advances in Resist Technology and Processing 1999
Fluorescence of poly(di-n-alkylsilane)s in room-temperature solution
- Ya-Ping Sun
- Robert D. Miller
- et al.
- 1991
- Journal of Inorganic and Organometallic Polymers
Studies of chain conformational kinetics in poly(di-n-alkylsilanes) by spectroscopic methods. III. Fourier transform Raman studies of unsymmetric side chain substitution
- V.M. Hallmark
- R. Sooriyakumaran
- et al.
- 1989
- The Journal of Chemical Physics
Temperature dependence of the third-order nonlinear optical susceptibilities in polysilanes and polygermanes
- J.-C. Baumert
- G.C. Bjorklund
- et al.
- 1988
- Applied Physics Letters
Soluble alkyl substituted polygermanes: Thermochromic behavior
- R.D. Miller
- R. Sooriyakumaran
- 1987
- Journal of Polymer Science Part A: Polymer Chemistry