Approaches to etch resistant 193-nm photoresists: Performance and prospects
- R.D. Allen
- Juliann Opitz
- et al.
- 1999
- SPIE Advances in Resist Technology and Processing 1999
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76 results for R. Sooriyakumaran
Development of an incremental structural parameter model for predicting reactive ion etch rates of 193 nm photoresist polymers
- Thomas I. Wallow
- P.J. Brock
- et al.
- 1999
- SPIE Advances in Resist Technology and Processing 1999
Fluorescence of poly(di-n-alkylsilane)s in room-temperature solution
- Ya-Ping Sun
- Robert D. Miller
- et al.
- 1991
- Journal of Inorganic and Organometallic Polymers
Studies of chain conformational kinetics in poly(di-n-alkylsilanes) by spectroscopic methods. III. Fourier transform Raman studies of unsymmetric side chain substitution
- V.M. Hallmark
- R. Sooriyakumaran
- et al.
- 1989
- The Journal of Chemical Physics
Temperature dependence of the third-order nonlinear optical susceptibilities in polysilanes and polygermanes
- J.-C. Baumert
- G.C. Bjorklund
- et al.
- 1988
- Applied Physics Letters
Soluble alkyl substituted polygermanes: Thermochromic behavior
- R.D. Miller
- R. Sooriyakumaran
- 1987
- Journal of Polymer Science Part A: Polymer Chemistry