New environmentally stable positive tone chemically amplified resist system - KRS
- Wu-Song Huang
- R.W. Kwong
- et al.
- 1993
- MRS Fall Meeting 1993
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34 results for Wu-Song Huang
Development of KrF hybrid resist for a dual isolation application
- Sen Liu
- Steven Holmes
- et al.
- 2013
- SPIE Advanced Lithography 2013
A silicon-containing resist for immersion lithography
- Ratnam Sooriyakumaran
- Wu-Song Huang
- et al.
- 2010
- Proceedings of SPIE - The International Society for Optical Engineering 2010
Resist freezing process for double exposure lithography
- Kuang-Jung Rex Chen
- Wu-Song Huang
- et al.
- 2008
- SPIE Advanced Lithography 2008
A new class of low bake resists for 193-nm immersion lithography
- Ratnam Sooriyakumaran
- Richard DiPietro
- et al.
- 2008
- SPIE Advanced Lithography 2008
Molecular resists based on Polyhedral Oligomeric Silsesquioxanes (POSS)
- Ratnam Sooriyakumaran
- Hoa Truong
- et al.
- 2005
- Microlithography 2005
Studies of acid diffusion in low Ea chemically amplified photoresists
- G.M. Wallraff
- D. Medeiros
- et al.
- 2005
- Microlithography 2005
Silsesquioxane-based 193 nm bilayer resists: Characterization and lithographic evaluation
- Hiroshi Ito
- Hoa D. Truong
- et al.
- 2005
- Microlithography 2005
Sub-50 nm half-pitch imaging with a low activation energy chemically amplified photoresist
- G.M. Wallraff
- D. Medeiros
- et al.
- 2004
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Current Developments of a High Performance CA Resist for Mask Making Application
- Wu-Song Huang
- Wei He
- et al.
- 2003
- Photomask and Next-Generation Lithography Mask Technology 2003