Nitrogen implantation and diffusion in silicon
- Lahir Shaik Adam
- Mark E. Law
- et al.
- 1999
- MRS Spring Meeting 1999
Publications
This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.
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11 results for M.E. Law
Concentration dependence of boron-interstitial cluster (BIC) formation in silicon-on-insulator (SOI)
- A.F. Saavedra
- K.S. Jones
- et al.
- 2004
- MRS Proceedings 2004
Silicon self-interstitial cluster formation and dissolution in SOI
- A.F. Saavedra
- J. Frazer
- et al.
- 2002
- MRS Proceedings 2002
Representing and manipulating fields for TCAD
- Martin D. Giles
- Goodwin R. Chin
- et al.
- 1992
- NUPAD 1992
B segregation to grain boundaries and diffusion in polycrystalline Si with flash annealing
- S. Jin
- K.S. Jones
- et al.
- 2012
- Journal of Applied Physics
Electrical activation in silicon-on-insulator after low energy boron implantation
- Antonio F. Saavedra
- Kevin S. Jones
- et al.
- 2004
- Journal of Applied Physics
Comparison of {311} Defect Evolution in SIMOX and Bonded SOI Materials
- A.F. Saavedra
- K.S. Jones
- et al.
- 2004
- JES
Kinetics of {3 1 1} defect dissolution in silicon-on-insulator (SOI)
- A.F. Saavedra
- K.S. Jones
- et al.
- 2004
- Materials Science and Engineering: B
Comprehensive model for nitrogen diffusion in silicon
- Lahir Shaik Adam
- Mark E. Law
- et al.
- 2001
- Technical Digest-International Electron Devices Meeting
A physical model for implanted nitrogen diffusion and its effect on oxide growth
- Lahir Shaik Adam
- Mark E. Law
- et al.
- 2000
- Technical Digest - International Electron Devices Meeting