Two-dimensional mask effects at the 14 nm logic node
- A.E. Zweber
- A.E. McGuire
- et al.
- 2013
- SPIE Photomask Technology 2013
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4 results for Anne McGuire
EUV mask line edge roughness
- Amy E. Zweber
- Emily Gallagher
- et al.
- 2012
- SPIE Advanced Lithography 2012
Airborne chemical contamination of a chemically amplified resist
- Scott A. MacDonald
- N.J. Clecak
- et al.
- 1991
- Microlithography 1991
Advanced lithography kits: Serifs and hammerhead
- Hang-Yip Liu
- Steffen Schulze
- et al.
- 2000
- Proceedings of SPIE - The International Society for Optical Engineering