EUV mask line edge roughness
- Amy E. Zweber
- Emily Gallagher
- et al.
- 2012
- SPIE Advanced Lithography 2012
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88 results for Phil Brock
Visualization of the develop process
- Linda K. Sundberg
- Gregory M. Wallraff
- et al.
- 2011
- SPIE Advanced Lithography 2011
Extending photo-patternable low-κ concept to 193 nm lithography and e-beam lithography
- Qinghuang Lin
- Alshakim Nelson
- et al.
- 2011
- SPIE Advanced Lithography 2011
Bound PAG resists: An EUV and electron beam lithography performance comparison of fluoropolymers
- Luisa D. Bozano
- Phillip J. Brock
- et al.
- 2011
- SPIE Advanced Lithography 2011
Silsesquioxane-based photo-patternable porous low-k
- Dielectric Materials
- Jitendra S. Rathore
- et al.
- 2010
- MRS Spring Meeting 2010
Patternable low-κ material for "greener" semiconductor manufacturing
- Qinghuang Lin
- Shyng-Tsong Chen
- et al.
- 2010
- ICSICT 2010
A silicon-containing resist for immersion lithography
- Ratnam Sooriyakumaran
- Wu-Song Huang
- et al.
- 2010
- Proceedings of SPIE - The International Society for Optical Engineering 2010
Multi-level integration of patternable low-κ material into advanced Cu BEOL
- Qinghuang Lin
- Shyng-Tsong Chen
- et al.
- 2010
- Proceedings of SPIE - The International Society for Optical Engineering 2010
Integration of photo-patternable low-κ material into advanced Cu back-end-of-the-line
- Qinghuang Lin
- Alshakim Nelson
- et al.
- 2010
- Japanese Journal of Applied Physics
Investigation of polymer-bound PAGs: Synthesis, characterization and initial structure/property relationships of anion-bound resists
- Robert D. Allen
- Phillip J. Brock
- et al.
- 2009
- J. Photopolym. Sci. Tech.