Self-segregating materials for immersion lithography
- Daniel P. Sanders
- Linda K. Sundberg
- et al.
- 2008
- SPIE Advanced Lithography 2008
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88 results for Phil Brock
Lactones in 193 nm resists: What do they do?
- Hiroshi Ito
- Hoa D. Truong
- et al.
- 2008
- SPIE Advanced Lithography 2008
A new class of low bake resists for 193-nm immersion lithography
- Ratnam Sooriyakumaran
- Richard DiPietro
- et al.
- 2008
- SPIE Advanced Lithography 2008
Molecular-controlled fracture and release of templated nanoporous organosilicate thin films
- Markus D. Ong
- Willi Volksen
- et al.
- 2008
- Advanced Materials
Fluoroalcohol materials with tailored interfacial properties for immersion lithography
- Daniel P. Sanders
- Linda K. Sundberg
- et al.
- 2007
- SPIE Advanced Lithography 2007
Contact angles & structure/surface property relationships of immersion materials 65191Q
- Linda K. Sundberg
- Daniel P. Sanders
- et al.
- 2007
- SPIE Advanced Lithography 2007
Fundamental properties of fluoroalcohol-methacrylate polymers for use in 193nm lithography
- R.D. Allen
- G. Breyta
- et al.
- 2006
- J. Photopolym. Sci. Tech.
Silicon containing polymer in applications for 193 nm high NA lithography processes
- Scan Bums
- Dirk Pfeiffer
- et al.
- 2006
- SPIE Advanced Lithography 2006
Imaging thin films of nanoporous low-k dielectrics: Comparison between ultramicrotomy and focused ion beam preparations for transmission electron microscopy
- Leslie E. Thompson
- Philip M. Rice
- et al.
- 2005
- Microscopy and Microanalysis
Mechanical and dielectric characterization of low-k, porous organosilicates
- Willi Volksen
- Teddie P. Magbitang
- et al.
- 2005
- VMIC 2005