Optimizing stressor film deposition sequence in polish rate order for best planarization
- John H. Zhang
- Changyong Xiao
- et al.
- 2011
- MRS Spring Meeting 2011
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Developing contact oxide CUP process for 32 nm technology nodes
- John H. Zhang
- Rajasekhar Venigalla
- et al.
- 2008
- VMIC 2008