Fast source independent estimation of lithographic difficulty supporting large scale source optimization
- David Demaris
- Maria Gabrani
- et al.
- 2012
- SPIE Advanced Lithography 2012
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20 results for Kehan Tian
Radiometric consistency in source specifications for photolithography
- Alan E. Rosenbluth
- Jaione Tirapu Azpiroz
- et al.
- 2011
- COSI 2011
Qualification, monitoring, and integration into a production environment of the world's first fully programmable illuminator
- Gregory McIntyre
- Daniel Corliss
- et al.
- 2011
- SPIE Advanced Lithography 2011
Applicability of global source mask optimization to 22/20nm node and beyond
- Kehan Tian
- Moutaz Fakhry
- et al.
- 2011
- SPIE Advanced Lithography 2011
Computational lithography: Exhausting the resolution limits of 193-nm projection lithography systems
- David O. S. Melville
- Alan E. Rosenbluth
- et al.
- 2011
- Journal of Vacuum Science and Technology B
Demonstrating the benefits of source-mask optimization and enabling technologies through experiment and simulations
- David Melville
- Alan E. Rosenbluth
- et al.
- 2010
- SPIE Advanced Lithography 2010
Dynamic group velocity control in a mechanically tunable photonic-crystal coupled-resonator optical waveguide
- Kehan Tian
- William Arora
- et al.
- 2009
- Physical Review B - CMMP
A computational technique to optimally design in-situ diffractive elements: Applications to projection lithography at the resist resolution limit
- Gonzalo R. Feijóo
- Jaione Tirapu-Azpiroz
- et al.
- 2009
- SPIE Advanced Lithography 2009
Benefits and trade-offs of global source optimization in optical lithography
- Kehan Tian
- Azalia Krasnoperova
- et al.
- 2009
- SPIE Advanced Lithography 2009
Experimental result and simulation analysis for the use of pixelated illumination from source mask optimization for 22nm logic lithography process
- Kafai Lai
- Alan E. Rosenbluth
- et al.
- 2009
- SPIE Advanced Lithography 2009