RTA-driven intra-die variations in stage delay, and parametric sensitivities for 65nm technology
- I. Ahsan
- N. Zamdmer
- et al.
- 2006
- VLSI Technology 2006
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13 results for Sadanand Deshpande
Lower resistance scaled metal contacts to silicide for advanced CMOS
- A. Topol
- C. Sheraw
- et al.
- 2006
- VLSI Technology 2006
Trimming of hard-masks by gaseous chemical oxide removal (COR) for sub-10nm gates/fins, for gate length control and for embedded logic
- Wesley C. Natzle
- David Horak
- et al.
- 2004
- ASMC 2004