SrHfO3 as gate dielectric for future CMOS technology
- C. Rossel
- M. Sousa
- et al.
- 2007
- Microelectronic Engineering
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29 results for K. Babich
Effects of precursor additives on the stability of plasma enhanced chemical vapor deposited a-GeC(O):H films
- A. Grill
- S. Guilley
- et al.
- 2002
- Journal of Materials Research
Tunable anti-reflective coatings with built-in hard mask properties facilitating thin resist processing
- Arpan P. Mahorowala
- Katherina Babich
- et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
Evaluation of molybdenum silicide for use as a 193 nm phase-shifting absorber in photomask manufacturing
- M. Hibbs
- M. Ushida
- et al.
- 2001
- Proceedings of SPIE- The International Society for Optical Engineering
Novel Si-based composite thin films for 193/157 nm attenuated phase shift mask(APSM) applications
- S. Jay Chey
- C.R. Guarnieri
- et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
When is bilayer thin-film imaging suitable: Comparison with single layer resists
- Scott Halle
- Alan Thomas
- et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
Transfer etching of bilayer resists in oxygen-based plasmas
- A. Mahorowala
- K. Babich
- et al.
- 2000
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Diffusion and distribution of photoacid generators in thin polymer films
- Qinghuang Lin
- Marie Angelopoulos
- et al.
- 2000
- Materials Research Society Symposium - Proceedings
Lithographic evaluation of a DUV carbon attenuated phase shift mask
- A.C. Callegan
- K. Babich
- et al.
- 1998
- Microelectronic Engineering