High performance UTBB FDSOI devices featuring 20nm gate length for 14nm node and beyondQ. LiuM. Vinetet al.2013IEDM 2013
High performance extremely thin SOI (ETSOI) hybrid CMOS with Si channel NFET and strained SiGe channel PFETK. ChengA. Khakifiroozet al.2012IEDM 2012
Strain engineered extremely thin SOI (ETSOI) for high-performance CMOSA. KhakifiroozKangguo Chenget al.2012VLSI Technology 2012